Sell Gasonics Aura 1000 Plasma Stripper (Upgraded) from Allwin21
Wafer handling problems with Indexer System? Allwin21 has replaced the GaSonics Aura 1000 wafer handling system with the superior 3-axis Equipe ATM Wafer Handling Robot. This gives the A 1000 a much superior wafer transport system with proven reliability, higher throughput, increased MTBF and lower overall cost. Along with fewer headaches, better peace-of-mind, and longer coffee breaks.
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GaSonic Aura 1000 Plasma System is the microprocessor controlled down-stream, or ˇ° afterglowˇ± photoresist stripper that will strip the front and backside of a wafer, typically in less than one minute. The unit is fully automated, cassette-to-cassette, and is a single-wafer process design.
Combined with Allwin21 Corp advanced Equip Robot transfer wafer technology , Superior Temperature Control Technology and AW Control Software, upgraded Gasonics Aura 1000 provides significant advantages over the original systems.
Use Equip robot wafer transfer instead of the index of the original, which will decrease the down time and low the wafer damage, particles greatly.
Single-wafer process
3ˇ±, 4ˇ±, 5ˇ± and 6ˇ± wafer capability
Automatic Equip robot wafer loader / unloader
Infrared heat source for process temperature control
Downstream processing: No wafer radiation damage(<0.1 volt CV shift)
Automatic photo emission type end-point detection
Front and backside resist removal
Pentium PC computer equipped either DOS Windows
Interface control board with parallel connectors between PC computer and the Aura-1000 system
New 16 bits A/D measurement system to replace original 12 bits A/D system to improve the accuracy of the measurements of gas flow, vacuum pressure, EOP, temperature of the wafer, etc. to improve the repeatability of the Asher process.
New 14 bits D/A system to replace original old 8 bits D/A to improve the accuracy of the set point of the vacuum pressure, gas flow, etc.
Add new RTP system to get more accuracy temperature control to improve the repeatability of the process. The new RTP system includes(1)New lamp control system with new special solid-state relay control system. It is similar to the oven control system of the RTP machine;(2)New zero crossing detects system. It is similar to the zero crossing detect of the RTP machine.(3)K-type thermocouple system with vacuum feed-through and amplifier to measure the temperature of the wafer. The thermocouple is touching the backside of the wafer directly. The feed-through is put on the front door, which is good when the wafer heated at 450 degree C.(4)Replace the center lamp of the system to be the same high power as the side one to speed up the heat speed and improve the uniformity of the asher and descum process.
User-friendly recipe editor with gas flow set point, vacuum pressure set point, RF on or off set up, temperature setup etc.
New GUI interface with curves display of the temperature, vacuum pressure, gas flow, RF status, EOP signal etc. during the process.
Saved all process data on the local hard disk and send data to the server if it is needed (option).
Saved all operation function, date, time and error message on the lot file.
Wafer ID reading function to read wafer ID and use the wafer ID for the data ID to save the process data. Data saved with 4 layers: (1) directory (say year 2003,2004), (2) lot ID, (3) Date Time or step ID, (4) wafer ID. So it is easy to trace the data.
Bar code function for the lot ID, recipe ID selection option.
Manual and auto process running
System diagnostics for the quick diagnostic of the system
Easier I/O set and checks function for the Maintenance
C accuracy from 501~2 RTP function with temperature control C with K-type thermocouple.to 500
Higher through put.
Advanced accurate temperature control to make much better repeatability
Better uniformity duo to the center lamp has the same power as the side lamp
All process data saved and easier for failure analyzer and process debug
ˇ°Exposedˇ± I/O, A/D, D/A is easier for troubleshooting and maintenance.
Tools would be painted and cleaned up
Chamber would be re-anodized
Upgraded Matrix205 Applications
Photoresist Stripping
High dose implant (As+, B+, P+)
Post-polysilicon etch
Post-metal etch
Post-oxide etch
Rework
Controlled Resist Removal
Post-develop descum (pre-etch)
Dry/wet process capability
Resist planarization
Uniformity capability (5% )1
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The AW Control Software provides a unique upgrade for RTP, Stripper, Etching and other systems which have won a high reputation among our customers.
The AW software Integrates all of the Process Control into a single reliable software package. It allows the user to control the entire machine from one single interface. The user can create recipes, run processes with the recipes, view and analyze process parameters, calibrate the entire system, and run diagnostics routines.
Features:
• GUI interface
• Real-Time process data acquisition
• Real-Time graphics
• Process Data Analysis
• Process Data and Recipe storage on a hard drive.
• Recipe Editor for Multi-step Processing
• System Calibration and Diagnostics
• Closed-loop System Controls
It has a Graphics User Interface (GUI) instead of the old Text based user interface. It is intuitive and easy to use with mouse or touch screen (optional).
The AW software Acquires Process Data in real-time. It then plots it in real-time on a graphics X-Y plot. So, what you see is what is actually happening. The process data is stored on a hard disk in real-time. This data can latter be retrieved and analyzed.
The blue line is the actual temperature. The black line is the recipe curve. The red line is the power changing for the heating source.
The AW software contains a Recipe Editor for creating and editing of multi-step process recipes. Recipes are created to automate the process of semiconductor wafers by telling the process control how to control each available parameter. It also allows the fine-tuning of certain parameters for specific applications.
It has comprehensive System Calibration and Diagnostics routines to automate many tasks and to help troubleshoot the system.
By maintaining real-time independent Closed-loop System Controls, the system optimizes vital device parameters
The AW Software upgrade uses a Pentium class computer, eliminating the old 80386 CPU, 6800 MPU, or the Z-80 MPU.
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Superior Temperature Control Technology
The software incorporates a Superior Temperature Control Technology that surpasses all original manufactures specs. The AW software is capable of controlling the temperature of the wafer to ˇŔ 1ˇăC. It is also able to control the temperature from wafer-to-wafer to ˇŔ 0.5ˇăC. This is possible with the built-in automated calibration routines and the upgraded 16 bit D/A card. First, the A/D circuits for the
temperature feedback devices are calibrated. Then the pyrometer (optional on some systems) is calibrated. In order for the software to understand the thermal capacitance of the system, the chamber is also calibrated. These calibration routines allow the software to understand the complete system, taking into consideration the subtleties of the A/D circuits and the thermal capacitance of heating and cooling of the process chamber.
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Plasma Asher Stripper Descum
In semiconductor manufacturing plasma asher/stripper is the process of removing the photoresist from an etched wafer. Using a plasma source, a monatomic reactive species is generated. Oxygen or fluorine are the most common reactive species. The reactive species combines with the photoresist to form ashing which is removed with a vacuum pump.
Typically, monatomic (single atom) oxygen plasma is created by exposing oxygen gas (O2) to ionizing radiation. At the same time, many free radicals are formed which could damage the wafer. Newer, smaller circuitry is increasingly susceptible to these particles. Originally, plasma was generated in the process chamber, but as the need to get rid of free radicals has increased, many machines now use a downstream plasma configuration, where plasma is formed remotely and channeled to the wafer. This allows electrically charged particles time to recombine before they reach the wafer surface, and prevents damage to the wafer surface.
Monatomic oxygen is electrically neutral and although it does recombine during the channeling, it does so at a slower rate than the positively or negatively charged free radicals, which attract one another. Effectively, this means that when all of the free radicals have recombined, there is still a portion of the active species available for process. Because a large portion of the active specie is lost to recombination, process times may take longer. To some extent, these longer process times can be mitigated by increasing the temperature of the reaction area.
Allwin21 Corp focuses on the following main Asher Stripper Descum equipments.
Matrix 105
Matrix 205
Gasonics Aura 1000
Gasonics Aura 2000
Gasonics Aura 3010
Tegal 901e
Tegal 903e
Branson IPC 3000
These systems can be used as descum which can increase the yield of optical lithography.
AW Control Software provides the unique upgrade system for Matrix, Gasonics Aura, Tegal, Branson IPC Series. Advantage of upgraded system include:
Integrated process control system
Real time graphics display
Real time process data acquisition, display, and analysis
Programmed comprehensive calibration and diagnostic functions
Better performance and maintenance than the original systems
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We focus on the following tools.
Rapid Thermal Process/Annealing.
(1)Upgraded AG 210 (2)Upgraded AG 410 (3)Upgraded AG 610(AccuThermo AW 610).
Plasma Etch/Asher/Descum.
(1)Upgraded Matrix 105 (2)Upgraded Matrix 205 (3)Upgraded Matrix 303 (4)Upgraded Matrix 403
(5)Upgraded Tegal 901 (6)Upgraded Tegal 903 (7)Upgraded Tegal 901e(8)Upgraded Tegal 903e
(9)Upgraded Gasonics AE 2001 (10)Upgraded Gasonics Aura 1000 (11)Upgraded Gasonics Aura 3010
(12)Upgraded Gasonics PEP 3510 (13)Upgraded Branson IPC 3000
PECVD/RIE/ICP.
(1)STS 310 (2)STS 320 (3)Plasma Thermal 700 720 (4)Plasma Thermal 790
Probe/Tester.
(1)EG 1034 (2)EG 2001 (3)EG 2010 (4)HP 4062 (5)HP 4145B (6)HP 4142B (7)HP 4155
(8)HP 4084B (9)HP 4085B
Http://www.allwin21.com
peterchen@allwin21.com
